Journal Article

PreJuSER-41146

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Mononuclear precursor for MOCVD of HfO2 thin films

Baunemann, A. ; Becker, R. ; Winter, M. ; Fischer, R. A. ; Thomas, R.FZJ* ; Ehrhart, P.FZJ* ; Waser, R.FZJ* ; Devi, A.

2004
Soc. Cambridge

This record in other databases:    

Please use a persistent id in citations: http://hdl.handle.net/2128/994  http://hdl.handle.net/2128/2881  doi:10.1039/b405015k

Abstract: We report the precursor characteristics of a novel mononuclear mixed alkoxide compound [Hf(O(i)Pr)2(tbaoac)2] and its application towards MOCVD of HfO2 thin films in a production tool CVD reactor.

Keyword(s): J

Note: Record converted from VDB: 12.11.2012

---

Contributing Institute(s):

1. Elektronische Materialien (IFF-IEM)
2. Center of Nanoelectronic Systems for Information Technology (CNI)

Research Program(s):

1. Materialien, Prozesse und Bauelemente für die Mikro- und Nanoelektronik (I01)

Appears in the scientific report 2004

---

Database coverage:

---