Contribution to a book FZJ-2018-03778

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Conductive AFM for nanoscale analysis of high-k dielectric metal oxides

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2019
Springer Cham
ISBN: 978-3-030-15611-4 (print), 978-3-030-15612-1 (electronic)

Electrical Atomic Force Microscopy for Nanoelectronics Cham : Springer, NanoScience and Technology 29 - 70 () [10.1007/978-3-030-15612-1_2]

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Abstract: Conductive atomic force microscopy has become a valuable tool for investigation of electronic transport properties with utmost lateral resolution. In this chapter, we prevent an overview about C-AFM applications to high-k semiconductors, which are key materials for future energy-efficient information technology.


Contributing Institute(s):
  1. Technoökonomische Systemanalyse (IEK-3)
  2. Elektronische Materialien (PGI-7)
  3. JARA-FIT (JARA-FIT)
  4. Elektrochemische Verfahrenstechnik (IEK-14)
Research Program(s):
  1. 135 - Fuel Cells (POF3-135) (POF3-135)

Appears in the scientific report 2019
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Document types > Books > Contribution to a book
JARA > JARA > JARA-JARA\-FIT
Institute Collections > ICE > ICE-2
Institute Collections > IET > IET-4
Institute Collections > PGI > PGI-7
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Workflow collections > Publication Charges
IEK > IEK-14
IEK > IEK-3
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 Record created 2018-06-27, last modified 2024-07-12


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