Journal Article

FZJ-2021-06145

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Impact of vacancies and impurities on ferroelectricity in PVD- and ALD-grown HfO 2 films

Baumgarten, L. (Corresponding author)FZJ* ; Szyjka, T.FZJ* ; Müller, M.FZJ*

2021
American Inst. of Physics Melville, NY

This record in other databases:    

Please use a persistent id in citations: http://hdl.handle.net/2128/29756  doi:10.1063/5.0035686

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Contributing Institute(s):

1. Elektronische Eigenschaften (PGI-6)

Research Program(s):

1. 5211 - Topological Matter (POF4-521) (POF4-521)

Appears in the scientific report 2021

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Database coverage:
; ; ; Clarivate Analytics Master Journal List ; Current Contents - Electronics and Telecommunications Collection ; Current Contents - Physical, Chemical and Earth Sciences ; Ebsco Academic Search ; Essential Science Indicators ; IF < 5 ; JCR ; National-Konsortium ; Nationallizenz ; PubMed Central ; SCOPUS ; Science Citation Index Expanded ; Web of Science Core Collection

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