E2SWITCH
Energy Efficient Tunnel FET Switches and Circuits
Coordinator | Swiss Federal Institute of Technology in Zurich ; SCIPROM SARL ; Consorzio Nazionale Interuniversitario Per La Nanoelettronica ; École Polytechnique Fédérale de Lausanne ; CAMBRIDGE CMOS SENSORS LIMITED ; Lunds universitet ; Forschungszentrum Jülich ; IBM Research GmbH ; INTERUNIVERSITAIR MICRO-ELECTRONICA CENTRUM |
Grant period | 2013-11-01 - 2017-10-31 |
Funding body | European Union |
Call number | FP7-ICT-2013-11 |
Grant number | 619509 |
Identifier | G:(EU-Grant)619509 |
All known publications ...
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Journal Article
Strained Silicon Complementary TFET SRAM: Experimental Demonstration and Simulations
IEEE journal of the Electron Devices Society 6, 1033 - 1040 (2018) [10.1109/JEDS.2018.2825639]
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Conference Presentation (After Call)
Investigation of TFETs with Vertical Tunneling Path for Low Average Subthreshold Swing
2017 International Conference on Solid State Devices and Materials, SSDM, SendaiSendai, Japan, 19 Sep 2017 - 22 Sep 2017
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Journal Article
Schottky barrier tuning via dopant segregation in NiGeSn-GeSn contacts
Journal of applied physics 121(20), 205705 - (2017) [10.1063/1.4984117]
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Journal Article
Correlation of Bandgap Reduction with Inversion Response in (Si)GeSn/High-k/Metal Stacks
ACS applied materials & interfaces 9(10), 9102 - 9109 (2017) [10.1021/acsami.6b15279]
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Journal Article
Process modules for GeSn nanoelectronics with high Sn-contents
Solid state electronics 128, 54 - 59 (2017) [10.1016/j.sse.2016.10.024]
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Conference Presentation (After Call)
Compositional trends in GeSn contacts and MOScaps for electronic application
JSPS Meeting, JülichJülich, Germany, 24 Nov 2016 - 26 Nov 2016
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Poster (After Call)
Scaled tri-layer gate oxide for GeSn nanoelectronics
2016 Semiconductor Interface Specialists Conference (SISC), San DiegoSan Diego, USA, 7 Dec 2016 - 10 Dec 2016
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Contribution to a conference proceedings
Performance Benchmarking of p-type In0.65Ga0.35As/GaAs0.4Sb0.6 andGe/Ge0.93Sn0.07 Hetero-junction Tunnel FETs
2016 IEEE International Electron Devices Meeting (IEDM), San FranciscoSan Francisco, USA, 5 Dec 2016 - 7 Dec 2016
19.6.1-19.6.4 (2016)
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Journal Article
Low Temperature Deposition of High-k/Metal Gate Stacks on High-Sn Content (Si)GeSn-Alloys
ACS applied materials & interfaces 8(20), 13133 - 13139 (2016) [10.1021/acsami.6b02425]
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Conference Presentation (Other)
Investigation of ternary SiGeSn MOS structures
Semiconductor Interface Specialist Conference, SISC 2015, ArlingtonArlington, USA, 2 Dec 2015 - 5 Dec 2015
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All known publications ...
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